Sputtering Targets

What Is Sputtering?

Sputtering is a technology used to form a thin film on a silicon wafer, glass, or other substrate. Within a vacuum state maintained in a sputtering machine, a sputtering target is bombarded with argon ions. This causes atoms or molecules to be emitted from the sputtering target. The atoms or molecules are deposited and form a thin film on the substrate. A sputtering target is the object of the ion bombardment when sputtering takes place.

See the sputtering process explained in a video:

https://www.youtube.com/watch?v=3DuGuJacvmc