Our proprietary high-refractivity target, offering the following features.
- High-refractivity, high-transmittance film can be deposited at a fast rate by DC sputtering.
As an alternative material to TiO2, it enables higher productivity and improvement of optical properties.
- The target offers outstanding amorphous stability and barrier performance. It is suited for use as protective film of various kinds.
NS-5: For films with higher refractivity than TiO2 NS-5B: Deposition three times faster than TiO2
NS-5 Series basic properties
|Target||Ar+2%O2||Sputtering rate (Å/sec)||Film resistivity (Ω/cm)||Crystallization temperature|
NS-5 Series optical transmittance
Has similar transmittance to TiO2 in the visible light region.
NS-5 Series water vapor transmission rate (WVTR, measured by MOCON analyzer)
Barrier properties are superior to those of SiO2.
- Relative values with SiO2 (30 nm) as 1.
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